LLM-Powered Defect Generation – Tackling the Challenge of Rare Samples
By leveraging Large Language Models (LLMs) to intelligently synthesize thousands of defect samples, DeepWise Corp. breaks the bottleneck of insufficient data, rapidly producing diverse training datasets. This approach reduces annotation time by 80% and significantly enhances model generalization capabilities.
With our self-developed defect generation and annotation system, every defect detail is enhanced through brightness adjustment, scaling, and color transformation. LLM technology ensures AI models can more precisely identify even the smallest flaws.
ADC System × LLM: Real-Time Retraining & Adaptive Optimization
Universal Model Core + LLM-Driven Retraining Strategy: The system automatically collects abnormal prediction samples, quickly analyzes issues through a confusion viewer, and triggers a background retraining process to keep model accuracy at the forefront.
Flexible Parameter Adjustment & Access Control: Fine-tune inspection sensitivity in real time based on multiple criteria such as size, area, location, and score. This adaptability meets diverse manufacturing requirements while maintaining full operational and log records for complete traceability.
High-Speed Computing Platform – Zero Wait Time Experience
Equipped with the latest NVIDIA GPU acceleration and optimized system integration, our solution achieves millisecond-level inference speeds. Current machine utilization rates have greatly improved, reducing both missed and false detections, enabling more immediate and accurate yield monitoring.
Comprehensive Solutions – Multi-Angle Inspection & Behavior Monitoring
Multi-Angle Inspection Machine: Vibration bowl feeding combined with six-sided imaging enables one-stop, high-speed full inspection, seamlessly integrated into production lines for small components such as MLCCs.
AI SOP Behavior Monitoring: Combining LLMs with computer vision algorithms, the system captures abnormal operations in real time, triggers proactive alerts, and records complete logs—enhancing the quality of human-machine collaboration.
Exhibition Details
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Date: August 20 – 23 (Wednesday – Saturday)
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Venue: Taipei Nangang Exhibition Center, Hall 1, K Zone, Booth K-112
On-Site Highlights:
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Live demo of LLM-powered defect generation
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Interactive experience of ADC real-time retraining with confusion viewer
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Integrated multi-angle inspection + behavior monitoring solutions
Welcome to Booth K-112 and join us in witnessing the new era of inspection with AI × LLM!